IY

In-Seok Yeo

Samsung: 27 patents #4,599 of 75,807Top 7%
HE Hynix (Hyundai Electronics): 13 patents #31 of 1,604Top 2%
SH Sk Hynix: 9 patents #856 of 4,849Top 20%
IF Industry-Academic Cooperation Foundation: 1 patents #5 of 106Top 5%
KAIST: 1 patents #5,996 of 11,619Top 55%
Overall (All Time): #54,747 of 4,157,543Top 2%
50
Patents All Time

Issued Patents All Time

Showing 26–50 of 50 patents

Patent #TitleCo-InventorsDate
7344773 Methods of forming nanoparticle based monolayer films with high particle density and devices including the same Kolake Mayya Subramanya 2008-03-18
7338862 Methods of fabricating a single transistor floating body DRAM cell having recess channel transistor structure Zong-Liang Huo, Seung-Jae Baik, Hong-Sik Yoon, Shi-Eun Kim 2008-03-04
7274066 Semiconductor memory devices and methods of fabricating the same Zong-Liang Huo, Seung-Jae Baik 2007-09-25
7157339 Method for fabricating semiconductor devices having dual gate oxide layers Kwan-Yong Lim, Heung-Jae Cho, Dae-Gyu Park, Tae-Ho Cha 2007-01-02
7148106 Methods of fabricating non-volatile memory devices including nanocrystals Kyong-Hee Joo, Jin-Ho Park, Seung Hyun Lim 2006-12-12
6828185 CMOS of semiconductor device and method for manufacturing the same Kwan-Yong Lim, Heung-Jae Cho, Dae-Gyu Park 2004-12-07
6537901 Method of manufacturing a transistor in a semiconductor device Tae-Ho Cha, Se-Aug Jang, Tae-Kyun Kim, Dea-Gyu Park, Jin Won Park 2003-03-25
6514827 Method for fabricating a dual metal gate for a semiconductor device Tae-Kyun Kim, Se-Aug Jang, Tae-Ho Cha 2003-02-04
6506676 Method of manufacturing semiconductor devices with titanium aluminum nitride work function Dae-Gyu Park, Tae-Ho Cha, Se-Aug Jang, Heung-Jae Cho, Tae-Kyun Kim +2 more 2003-01-14
6468914 Method of forming gate electrode in semiconductor device Se-Aug Jang 2002-10-22
6451639 Method for forming a gate in a semiconductor device Se-Aug Jang, Tae-Kyun Kim, Jae Young Kim 2002-09-17
6436775 MOSFET device fabrication method capable of allowing application of self-aligned contact process while maintaining metal gate to have uniform thickness Tae-Kyun Kim, Se-Aug Jang 2002-08-20
6420241 Method for forming an isolation region in a semiconductor device and resulting structure using a two step oxidation process Se-Aug Jang, Young Bog Kim, Jong Choul Kim 2002-07-16
6417055 Method for forming gate electrode for a semiconductor device Se-Aug Jang, Tae-Kyun Kim 2002-07-09
6387788 Method for forming polycide gate electrode of metal oxide semiconductor field effect transistor Se-Aug Jang 2002-05-14
6340629 Method for forming gate electrodes of semiconductor device using a separated WN layer Jean Lee 2002-01-22
6303494 Method of forming gate electrode in semiconductor device Se-Aug Jang 2001-10-16
6281054 SOI device and method for fabricating the same 2001-08-28
6281085 Method of manufacturing a semiconductor device 2001-08-28
6261911 Method of manufacturing a junction in a semiconductor device Jung-Ho Lee, Seung Chul Lee, Noh Yeal Kwak, Sahng Kyoo Lee 2001-07-17
6255206 Method of forming gate electrode with titanium polycide structure Se-Aug Jang, Tae-Kyun Kim, Sahng Kyoo Lee 2001-07-03
6218252 Method of forming gate in semiconductor device 2001-04-17
6180985 SOI device and method for fabricating the same 2001-01-30
6165884 Method of forming gate electrode in semiconductor device Sang Moo Lee, Hyeon Soo Kim 2000-12-26
6107144 Method for forming field oxide of semiconductor device and the semiconductor device Se-Aug Jang, Young Bog Kim, Jong Choul Kim 2000-08-22