Issued Patents All Time
Showing 51–58 of 58 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7135422 | Methods of forming a multi-layered structure using an atomic layer deposition process and methods of forming a capacitor of an integrated circuit device | Gab-Jin Nam, Jong Wan KWON, Jae-Soon Lim, Seung Hwan Lee, Ki-Chul Kim +2 more | 2006-11-14 |
| 6992346 | Integrated circuit devices with metal-insulator-metal capacitors | Ki-Chul Kim, Young Sun Kim, Gab-Jin Nam, Sung Tae Kim, Thomas Jongwan Kwon +1 more | 2006-01-31 |
| 6989338 | Method for forming a multi-layered structure of a semiconductor device and methods for forming a capacitor and a gate insulation layer using the multi-layered structure | Young-Wook Park, Eun-Taek Yim, Dong-Jo Kang, Kyoung-Seok Kim | 2006-01-24 |
| 6893501 | Method for manufacturing a semiconductor device having a capping layer covering a capacitor of the semiconductor device | Ki-Chul Kim, Sung Tae Kim, Young Sun Kim, Jeong-hee Chung, Wan-don Kim +1 more | 2005-05-17 |
| 6849517 | Methods of forming capacitors including reducing exposed electrodes in semiconductor devices | Jung-hee Chung, Young Sun Kim, Yun-Jung Lee | 2005-02-01 |
| 6800570 | Method of forming a metal oxide film | Sung Tae Kim, Young-Wook Park, Young Sun Kim, Ki-Chul Kim, In Sung Park | 2004-10-05 |
| 6649502 | Methods of forming multilayer dielectric regions using varied deposition parameters | Cha-young Yoo, Han-Jin Lim, Wan-don Kim, Se-Jin Lee, Soon-yeon Park +3 more | 2003-11-18 |
| 6599807 | Method for manufacturing capacitor of semiconductor device having improved leakage current characteristics | Jae-Soon Lim, Seung Hwan Lee, Yun-Jung Lee, Gab-Jin Nam, Ki-Yeon Park +2 more | 2003-07-29 |