BL

Byeong-Chan Lee

Samsung: 60 patents #1,324 of 75,807Top 2%
Applied Materials: 7 patents #1,721 of 7,310Top 25%
DN Dasan Networks: 1 patents #2 of 6Top 35%
📍 San Jose, CA: #572 of 32,062 inventorsTop 2%
🗺 California: #4,640 of 386,348 inventorsTop 2%
Overall (All Time): #30,746 of 4,157,543Top 1%
68
Patents All Time

Issued Patents All Time

Showing 51–68 of 68 patents

Patent #TitleCo-InventorsDate
7385237 Fin field effect transistors with low resistance contact structures Deok-Hyung Lee, In Deog BAE, Jong-Wook Lee 2008-06-10
7338867 Semiconductor device having contact pads and method for manufacturing the same Deok-Hyung Lee, Si-Young Choi, Chul-Sung Kim, In-Soo Jung, Jong-Ryeol Yoo 2008-03-04
7320908 Methods of forming semiconductor devices having buried oxide patterns Yong-Hoon Son, Si-Young Choi, Jong-Wook Lee, In-Soo Jung, Deok-Hyung Lee 2008-01-22
7268396 Finfets having first and second gates of different resistivities Deok-Hyung Lee, Si-Young Choi, In-Soo Jung 2007-09-11
7205609 Methods of forming semiconductor devices including fin structures and related devices Deok-Hyung Lee, Si-Young Choi, Yong-Hoon Son, In-Soo Jung 2007-04-17
7176067 Methods of fabricating fin field effect transistors In-Soo Jung, Deok-Hyung Lee, Si-Young Choi, Yong-Hoon Son 2007-02-13
7141456 Methods of fabricating Fin-field effect transistors (Fin-FETs) having protection layers Deok-Hyung Lee, Si-Young Choi, In-Soo Jung, Jin-Hwa Heo 2006-11-28
7141856 Multi-structured Si-fin Deok-Hyung Lee, In-Soo Jung, Yong-Hoon Son, Siyoung Choi, Taek Kim 2006-11-28
7122871 Integrated circuit field effect transistors including channel-containing fin having regions of high and low doping concentrations Deok-Hyung Lee, Si-Young Choi, Taek Kim, Yong-Hoon Son, In-Soo Jung 2006-10-17
7081391 Integrated circuit devices having buried insulation layers and methods of forming the same Si-Young Choi, Jong-Ryeol Yoo, Yong-Hoon Son, In-Soo Jung, Deok-Hyung Lee 2006-07-25
7074662 Methods for fabricating fin field effect transistors using a protective layer to reduce etching damage Deok-Hyung Lee, Si-Young Choi, Yong-Hoon Son, In-Soo Jung 2006-07-11
7071048 Methods of fabricating fin field effect transistors having capping insulation layers Yong-Hoon Son, Si-Young Choi, Deok-Hyung Lee, In-Soo Jung 2006-07-04
6963094 Metal oxide semiconductor transistors having a drain punch through blocking region and methods for fabricating metal oxide semiconductor transistors having a drain punch through blocking region Si-Young Choi, Chul-Sung Kim, Jong-Ryeol Yoo, Deok-Hyung Lee 2005-11-08
6900102 Methods of forming double gate electrodes using tunnel and trench Si-Young Choi, Jong-Ryeol Yoo, Deok-Hyung Lee, In-Soo Jung 2005-05-31
6890823 Methods of forming integrated circuits with thermal oxide layers on side walls of gate electrodes wherein the source and drain are higher than the gate electrode Si-Young Choi, Chul-Sung Kim, Jong-Ryeol Yoo, Deok-Hyung Lee 2005-05-10
6849520 Method and device for forming an STI type isolation in a semiconductor device Chul-Sung Kim, Si-Young Choi, Jung-Woo Park, Jong-Ryol Ryu 2005-02-01
6835996 Method and device for forming an STI type isolation in a semiconductor device Chul-Sung Kim, Si-Young Choi, Jung-Woo Park, Jong-Ryol Ryu 2004-12-28
6660613 Method and device for forming an STI type isolation in a semiconductor device Chul-Sung Kim, Si-Young Choi, Jung-Woo Park, Jong-Ryol Ryu 2003-12-09