Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12198987 | Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same | Hirokazu Sayama, Kazunobu Ohta, Hidekazu Oda | 2025-01-14 |
| 9847417 | Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same | Hirokazu Sayama, Kazunobu Ohta, Hidekazu Oda | 2017-12-19 |
| 9614081 | Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same | Hirokazu Sayama, Kazunobu Ohta, Hidekazu Oda | 2017-04-04 |
| 9412867 | Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same | Hirokazu Sayama, Kazunobu Ohta, Hidekazu Oda | 2016-08-09 |
| 9209191 | Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same | Hirokazu Sayama, Kazunobu Ohta, Hidekazu Oda | 2015-12-08 |
| 8809186 | Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same | Hirokazu Sayama, Kazunobu Ohta, Hidekazu Oda | 2014-08-19 |
| 8586475 | Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same | Hirokazu Sayama, Kazunobu Ohta, Hidekazu Oda | 2013-11-19 |
| 8372747 | Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same | Hirokazu Sayama, Kazunobu Ohta, Hidekazu Oda | 2013-02-12 |
| 7960281 | Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same | Hirokazu Sayama, Kazunobu Ohta, Hidekazu Oda | 2011-06-14 |
| 7470618 | Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same | Hirokazu Sayama, Kazunobu Ohta, Hidekazu Oda | 2008-12-30 |
| 7183204 | Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same | Hirokazu Sayama, Kazunobu Ohta, Hidekazu Oda | 2007-02-27 |
| 6906393 | Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same | Hirokazu Sayama, Kazunobu Ohta, Hidekazu Oda | 2005-06-14 |
| 6872642 | Manufacturing method of semiconductor device | Hidekazu Oda, Hirokazu Sayama, Kazunobu Ohta | 2005-03-29 |
| 6835610 | Method of manufacturing semiconductor device having gate electrode with expanded upper portion | Hirokazu Sayama, Kazunobu Ohta, Hidekazu Oda | 2004-12-28 |