KH

Katsuhiko Hotta

RE Renesas Electronics: 26 patents #62 of 4,529Top 2%
RT Renesas Technology: 18 patents #77 of 3,337Top 3%
HC Hitachi Ulsi Systems Co.: 10 patents #49 of 867Top 6%
HI Hitachi: 4 patents #8,942 of 28,497Top 35%
Overall (All Time): #58,188 of 4,157,543Top 2%
48
Patents All Time

Issued Patents All Time

Showing 26–48 of 48 patents

Patent #TitleCo-InventorsDate
7932606 Semiconductor device and a method of manufacturing the same Kyoko Sasahara 2011-04-26
7772700 Semiconductor device Jun Tanaka, Miharu Otani, Kiyoshi Ogata, Yasumichi Suzuki 2010-08-10
7718269 Semiconductor manufacturing method for inter-layer insulating film Masami Takayasu 2010-05-18
7705462 Semiconductor device and a method of manufacturing the same Ken Uchikoshi, Naokatsu Suwanai, Atsushi Tachigami, Masashi Sahara, Kazuhiko Sato 2010-04-27
7629251 Semiconductor device and a method of manufacturing the same Kyoko Sasahara 2009-12-08
7615848 Semiconductor device and a method of manufacturing the same Ken Uchikoshi, Naokatsu Suwanai, Atsushi Tachigami, Masashi Sahara, Kazuhiko Sato 2009-11-10
7602040 Semiconductor device and a method of manufacturing the same Kyoko Sasahara, Taichi Hayamizu, Yuichi Kawano 2009-10-13
7557034 Semiconductor device and a method of manufacturing the same Kyoko Sasahara 2009-07-07
7419901 Semiconductor device and a method of manufacturing the same Kyoko Sasahara, Taichi Hayamizu, Yuichi Kawano 2008-09-02
7400046 Semiconductor device with guard rings that are formed in each of the plural wiring layers Ken Uchikoshi, Naokatsu Suwanai, Atsushi Tachigami, Masashi Sahara, Kazuhiko Sato 2008-07-15
7372154 Semiconductor device Jun Tanaka, Miharu Otani, Kiyoshi Ogata, Yasumichi Suzuki 2008-05-13
7354855 Semiconductor device and a method of manufacturing the same Kyoko Sasahara 2008-04-08
7303986 Semiconductor device and a method of manufacturing the same Ken Uchikoshi, Naokatsu Suwanai, Atsushi Tachigami, Masashi Sahara, Kazuhiko Sato 2007-12-04
7247525 Method for manufacturing a semiconductor device Jun Tanaka, Miharu Otani, Kiyoshi Ogata, Yasumichi Suzuki 2007-07-24
7208391 Method of manufacturing a semiconductor integrated circuit device that includes forming an isolation trench around active regions and filling the trench with two insulating films Hidenori Sato, Norio Suzuki, Akira Takamatsu, Hiroyuki Maruyama, Takeshi Saikawa +1 more 2007-04-24
7189637 Method of manufacturing a semiconductor device having a multi-layered wiring structure Ken Uchikoshi, Naokatsu Suwanai, Atsushi Tachigami, Masashi Sahara, Kazuhiko Sato 2007-03-13
7074691 Method of manufacturing a semiconductor integrated circuit device that includes forming dummy patterns in an isolation region prior to filling with insulating material Hidenori Sato, Norio Suzuki, Akira Takamatsu, Hiroyuki Maruyama, Takeshi Saikawa +1 more 2006-07-11
7060589 Method for manufacturing a semiconductor integrated circuit device that includes covering the bottom of an isolation trench with spin-on glass and etching back the spin-on glass to a predetermined depth Hidenori Sato, Norio Suzuki, Akira Takamatsu, Hiroyuki Maruyama, Takeshi Saikawa +1 more 2006-06-13
6967407 Semiconductor device and method of manufacturing the semiconductor device Miharu Otani, Jun Tanaka, Yasumichi Suzuki, Takashi Inoue 2005-11-22
6838771 Semiconductor device having conductor layers stacked on a substrate Jun Tanaka, Miharu Otani, Kiyoshi Ogata, Yasumichi Suzuki 2005-01-04
6833331 Method of manufacturing semiconductor integrated circuit device having insulating film formed from liquid substance containing polymer of silicon, oxygen, and hydrogen Masayoshi Saito, Masayoshi Hirasawa, Masayuki Kojima, Hiroyuki Uchiyama, Hiroyuki Maruyama +1 more 2004-12-21
6693008 Method of manufacturing a semiconductor integrated circuit device and a semiconductor integrated circuit device Hidenori Sato, Norio Suzuki, Akira Takamatsu, Hiroyuki Maruyama, Takeshi Saikawa +1 more 2004-02-17
6509277 Method of manufacturing semiconductor integrated circuit device having insulatro film formed from liquid containing polymer of silicon, oxygen, and hydrogen Masayoshi Saito, Masayoshi Hirasawa, Masayuki Kojima, Hiroyuki Uchiyama, Hiroyuki Maruyama +1 more 2003-01-21