Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
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Daniel Dobkin — 11 Patents

RSR2 Semiconductor: 3 patents #6 of 12Top 50%
WCWatkins-Johnson Company: 2 patents #9 of 109Top 9%
AUAsml Us: 1 patents #12 of 55Top 25%
SLSilicon Valley Group, Thermal Systems Llp: 1 patents #5 of 16Top 35%
ULUtica Leaseco: 1 patents #20 of 51Top 40%
SGSemiconductor Equipment Gmbh: 1 patents #3 of 6Top 50%
CTCandescent Technologies: 1 patents #80 of 125Top 65%
Sunnyvale, CA: #2,552 of 14,302 inventorsTop 20%
California: #56,011 of 386,348 inventorsTop 15%
Overall (All Time): #435,149 of 4,157,543Top 15%
11 Patents All Time
Daniel Dobkin has been granted 11 US patents while listed as an inventor at R2 Semiconductor. The first was granted in 1994 and the most recent in November 2024. Daniel Dobkin ranks #435,149 of 4,157,543 US inventors in our database (top 10.5%). Patent records list Daniel Dobkin in Sunnyvale, CA, US.

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
12139804 Systems and methods for high-rate electrochemical arsine generation Nabil Khater, Kuanping Gong, Chaowei Wang 2024-11-12
9069365 DC-DC converter enabling rapid output voltage changes James E. Brown, Pablo Moreno Galbis, Cory Severson, David Fisher 2015-06-30
8843180 Multimode operation DC-DC converter James E. Brown, Pablo Moreno Galbis, Cory Severson, Lawrence M. Burns 2014-09-23
8725218 Multimode operation DC-DC converter James E. Brown, Pablo Moreno Galbis, Cory Severson, Lawrence M. Burns 2014-05-13
6521048 Single body injector and deposition chamber Adam Q. Miller 2003-02-18
6200389 Single body injector and deposition chamber Adam Q. Miller 2001-03-13
6022414 Single body injector and method for delivering gases to a surface Adam Q. Miller 2000-02-08
5865657 Fabrication of gated electron-emitting device utilizing distributed particles to form gate openings typically beveled and/or combined with lift-off or electrochemical removal of excess emitter material Duane A. Haven, Paul N. Ludwig, Christopher J. Spindt 1999-02-02
5691642 Method and apparatus for characterizing a plasma using broadband microwave spectroscopic measurements 1997-11-25
5639343 Method of characterizing group III-V epitaxial semiconductor wafers incorporating an etch stop layer 1997-06-17 $2,524,000
5304398 Chemical vapor deposition of silicon dioxide using hexamethyldisilazane Wilbur C. Krusell, James P. Garcia, Frederick F. Walker, Jose F. Casillas 1994-04-19 $1,891,000