Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7568180 | Generalization of the photo process window and its application to OPC test pattern design | Hans Eisenmann, Kai Peter, Dennis Ciplickas, Yunqiang Zhang | 2009-07-28 |
| 7434197 | Method for improving mask layout and fabrication | Christoph Dolainsky, Dennis Ciplickas, Joseph C. Davis, Rakesh Vallishayee, Howard Read +2 more | 2008-10-07 |