Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Optimized spatial modeling for optical CD metrology

Optimized spatial modeling for optical CD metrology

US Patent 9915522 · Granted Mar 13, 2018

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System and method for detecting fluid mixture2025
Method and device for measuring fluid in target pipeline2025
Automatic test pattern generation (ATPG) for parametric faults2023
Automatic wavelength or angle pruning for optical metrology2021
Overlay metrology system and method2021
Automatic selection of sample values for optical metrology2021
Dispersion model for band gap tracking2020
Library expansion system, method, and computer program product for metrology2020
Metrology system calibration refinement2020
Automatic determination of fourier harmonic order for computation of spectral in2019
Dispersion model for band gap tracking2019
System, method, and computer program product for automatically determining a par2019