Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for performing selective etching of a semiconductor material in solution

Method for performing selective etching of a semiconductor material in solution

US Patent 9831095 · Granted Nov 28, 2017

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for manufacturing a SOI or SiGeOI type semiconductor-on-insulator substra2025
Process for the hetero-integration of a semiconductor material of interest on a 2023
Method for fabricating a monocrystalline structure2022
Method for fabricating a monocrystalline structure2022
Selective removal of a silicon oxide layer2014
Microelectronic device, in particular back side illuminated image sensor, and pr2013
Method of wet cleaning a surface, especially of a material of the silicon-german2010
Manufacturing process for a transistor made of thin layers2009
Method of wet cleaning a surface, especially of a material of the silicon-german2007