Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Structures and methods of fabricating dual gate devices

Structures and methods of fabricating dual gate devices

US Patent 9577089 · Granted Feb 21, 2017

Estimated economic value: $10,292,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Game login method and device2025
Methods of manufacture of termination for vertical trench shielded devices2022
Virtual wafer techniques for fabricating semiconductor devices2022
Transistors with electrically active chip seal ring and methods of manufacture2022
Split gate semiconductor with non-uniform trench oxide2021
Semiconductor device having reduced gate charges and superior figure of merit2021
Edge termination designs for semiconductor power devices2021
Semiconductor device having multiple gate pads2021
Termination for vertical trench shielded devices2021
Trench MOSFET with self-aligned body contact with spacer2021
SGT MOSFET with adjustable CRSS and CISS2021
Trench MOSFET with self-aligned body contact with spacer2021