Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for direct formation of nanometer scaled features

Method and apparatus for direct formation of nanometer scaled features

US Patent 9466500 · Granted Oct 11, 2016

Estimated economic value: $23,860,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Thermal processing susceptor2025
Pulse train annealing method and apparatus2025
Supplemental energy for low temperature processes2024
Semiconductor processing tools with improved performance by use of hybrid learni2024
Apparatus and methods for alignment of a susceptor2024
Thermal processing susceptor2023
Enhanced process and hardware architecture to detect and correct realtime produc2023
Semiconductor processing tools with improved performance by use of hybrid learni2023
Gas injector with baffle2022
Stacked pixel structure formed using epitaxy2022
Display screen or portion thereof with graphical user interface2022
Plasma-enhanced anneal chamber for wafer outgassing2022