Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Photomask blank and photomask for suppressing heat absorption

Photomask blank and photomask for suppressing heat absorption

US Patent 9454073 · Granted Sep 27, 2016

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Phase shift mask for EUV lithography and manufacturing method for the phase shif2025
Phase shift mask for EUV lithography and manufacturing method for the phase shif2024
Photomask including transfer patterns for reducing a thermal stress2019
Photomask blank and photomask for suppressing heat absorption2018
Photomask including transfer patterns for reducing a thermal stress2017
Reflective mask and method of fabricating the same2017
Method for correcting pattern critical dimension in photomask2011
Method of correcting defect in photomask2011
Method with correction of hard mask pattern critical dimension for fabricating p2011
Photomask and method of fabricating the same2011
Method for repairing bridge in photo mask2010