Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Blank of titanium-doped glass with a high silica content for a mirror substrate for use in EUV lithography and method for the production thereof

Blank of titanium-doped glass with a high silica content for a mirror substrate for use in EUV lithography and method for the production thereof

US Patent 9416040 · Granted Aug 16, 2016

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Optical component made of quartz glass for use in ArF excimer laser lithography 2017
Method for producing synthetic quartz glass and quartz glass for use as cladding2016
Blank of titanium-doped glass with a high silica content for a mirror substrate 2015
Method for producing an optical component of synthetic quartz glass with enhance2011
Quartz glass blank and method for producing said blank2011
Method for making a blank from material, particularly for an optical component f2011
Holder made from quartz glass for the processing of semiconductor wafers and met2010
Method for producing synthetic quartz glass with predetermined hydroxyl group co2010
Material, particularly for an optical component for use in microlithography, and2010
Method for the production of laser-active quartz glass and use thereof2009
Optical component of quartz glass, method for producing said component, and meth2009