Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for establishing distortion properties of an optical system in a microlithographic measurement system

Method for establishing distortion properties of an optical system in a microlithographic measurement system

US Patent 9366637 · Granted Jun 14, 2016

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for reproducing a target wavefront of an imaging optical production syste2024
Device for measuring masks for microlithography and autofocusing method2023
Illumination optical unit for a metrology system and metrology system comprising2020
Illumination optical unit for a metrology system and metrology system comprising2019
Illumination optical unit for a metrology system and metrology system comprising2018
Mask inspection microscope with variable illumination setting2015
Method for determining the position of a structure within an image and position 2014