Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for providing uniform distribution of plasma density in a plasma treatment apparatus

Method for providing uniform distribution of plasma density in a plasma treatment apparatus

US Patent 9275840 · Granted Mar 1, 2016

Assignee

No assignee recorded.

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Modified etch-and-deposit Bosch process in silicon2021
3D printing apparatus using a beam of an atmospheric pressure inductively couple2020
Plasma beam penetration of millimeter scale holes with high aspect ratios2019
Showerhead-cooler system of a semiconductor-processing chamber for semiconductor2016
Torch system for depositing protective coatings on interior walls and recesses p2016
Method and apparatus for application of thin coatings from plasma onto inner sur2011
RF antenna assembly for treatment of inner surfaces of tubes with inductively co2011
Aerosol mass spectrometer for operation in a high-duty mode and method of mass-s2006
Mass spectrometry system for continuous control of environment2006
Ionization device for aerosol mass spectrometer and method of ionization2005
Electron-cyclotron resonance type ion beam source for ion implanter2004
Mass spectrometer based on the use of quadrupole lenses with angular gradient of2004