Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Toroidal plasma chamber for high gas flow rate process

Toroidal plasma chamber for high gas flow rate process

US Patent 9275839 · Granted Mar 1, 2016

Estimated economic value: $7,277,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Neuroprosthetic system and method for substituting a sensory modality of a mamma2025
Method and apparatus for plasma generation2024
Plasma source having a dielectric plasma chamber with improved plasma resistance2024
Valve apparatuses and related methods for reactive process gas isolation and fac2023
Multi-sensor gas sampling detection system for radical gases and short-lived mol2023
Method and apparatus for plasma generation2023
Multi-sensor gas sampling detection system for radical gases and short-lived mol2022
Projection night light2021
Plasma source having a dielectric plasma chamber with improved plasma resistance2021
Method and apparatus for processing dielectric materials using microwave energy2021
Toroidal plasma channel with varying cross-section areas along the channel2021
Rotating projection night light2020