Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Etching gas

Etching gas

US Patent 9234133 · Granted Jan 12, 2016

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Content distribution device2022
Dry etching agent composition and dry etching method2020
Storage container and storage method of Z-1-chloro-3,3,3-trifluoropropene2020
Method for producing 1,2-dichloro-3,3,3-Trifluoropropene2020
Ink composition for high-speed screen printing, printed article obtained by high2019
Durable and flexible ink composition for high-quality/high-definition screen pri2019
Azeotropic composition having fluorine-containing olefin as constituent2019
Azeotrope-like composition containing fluorinated olefin as component2019
Azeotropic like composition containing 2-chloro-1,3,3,3-tetrafluoropropene and 12018
High-quality/high-definition screen printing ink composition for glass substrate2018
Method for producing 2-chloro-1,3,3,3-tetrafluoropropene2017
Silicon dry etching method2016