Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Photolithography systems and associated methods of overlay error correction

Photolithography systems and associated methods of overlay error correction

US Patent 9195149 · Granted Nov 24, 2015

Estimated economic value: $9,739,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Photolithography systems and associated methods of overlay error correction2017
Photolithography systems and associated alignment correction methods2015
Photolithography monitoring mark, photolithography mask comprising an exposure m2012
Photolithography systems and associated methods of overlay error correction2012
Photolithography systems and associated methods of focus correction2012
Power-via structure for integration in advanced logic/smart-power technologies2009