Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Measurement apparatus to calculate wavefront aberration of optical system using shearing interference fringes, exposure apparatus, and method of manufacturing device

Measurement apparatus to calculate wavefront aberration of optical system using shearing interference fringes, exposure apparatus, and method of manufacturing device

US Patent 9175953 · Granted Nov 3, 2015

Estimated economic value: $68,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Measurement apparatus2018
Measuring apparatus including multi-wavelength interferometer2016
Shape measuring apparatus, and method of manufacturing article2016
Measuring apparatus2015
Measurement apparatus2014
Measurement apparatus2014
Interferometer and distance calculation method therefor2014
Measurement apparatus, exposure apparatus, and device fabrication method2014
Optical interferometer2013
Measuring apparatus2013
Measurement apparatus, exposure apparatus, and device manufacturing method to me2013
Lightwave interference measurement apparatus that calculates absolute distance u2013