Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods and systems for designing and manufacturing optical lithography masks

Methods and systems for designing and manufacturing optical lithography masks

US Patent 9064078 · Granted Jun 23, 2015

Estimated economic value: $1,346,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Dividing a chip design flow into sub-steps using machine learning2025
Modifying a current circuit design using data from one or more previous circuit 2025
Modular pressurized coal combustion (MPCC) for flexible generation2025
Methods for generating pH/ionic concentration gradient near electrode surfaces f2018
Methods for generating pH/ionic concentration gradient near electrode surfaces f2018
Devices and methods for long-term intracellular access2018
Methods for generating pH/ionic concentration gradient near electrode surfaces f2017
Method and system for automated generation of masks for spacer formation from a 2016
Methods for generating pH/ionic concentration gradient near electrode surfaces f2015
Methods for optical proximity correction in the design and fabrication of integr2015
Devices and methods for long-term intracellular access2014
Methods of modifying a physical design of an electrical circuit used in the manu2014