Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Photomask, and pattern formation method and exposure apparatus using the photomask

Photomask, and pattern formation method and exposure apparatus using the photomask

US Patent 9046783 · Granted Jun 2, 2015

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Layout method of semiconductor chip, semiconductor chip manufacturing method and2025
Method of manufacturing a semiconductor device2025
Fused hetero 5-membered ring molecule, p-type semiconductor film and electronic 2024
Fused thiophene molecule and p-type semiconductor film and electronic device2024
Method and computing device for manufacturing semiconductor device2023
Heterofullerene and n-type semiconductor film using same, and electronic device2022
Manufacturing methods of semiconductor devices2021
P-type semiconductor film containing heterofullerene, and electronic device2021
Methods of manufacturing semiconductor devices, method sof performing extreme ul2021
Semiconductor device having stacked chips, a re-distribution layer, and penetrat2018
Photomask, and method for creating pattern data thereof, and pattern forming met2017
Photomask and pattern forming method using photomask2016