Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Dopant ink compositions for forming doped regions in semiconductor substrates, and methods for fabricating dopant ink compositions

Dopant ink compositions for forming doped regions in semiconductor substrates, and methods for fabricating dopant ink compositions

US Patent 8975170 · Granted Mar 10, 2015

Estimated economic value: $12,388,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Crack-resistant polysiloxane dielectric planarizing compositions, methods and fi2021
Crack-resistant silicon-based planarizing compositions, methods and films2021
Gap filling dielectric materials2020
Low temperature SC1 strippable oxysilane-containing coatings2019
Antireflective coatings for via fill and photolithography applications and metho2015
Compositions, layers and films for optoelectronic devices, methods of production2014
Borate esters, boron-comprising dopants, and methods of fabricating boron-compri2014
Borate esters, boron-comprising dopants, and methods of fabricating boron-compri2014
Borate esters, boron-comprising dopants, and methods of fabricating boron-compri2014
Boron-comprising inks for forming boron-doped regions in semiconductor substrate2013
Boron-comprising inks for forming boron-doped regions in semiconductor substrate2013
Method for making toughening agent materials2013