Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Photo-resist with floating acid

Photo-resist with floating acid

US Patent 8936903 · Granted Jan 20, 2015

Estimated economic value: $11,644,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Film deposition for patterning process2025
Photoresist composition and method of manufacturing a semiconductor device2025
Non-DMSO stripper for advance package metal plating process2025
EUV metallic resist performance enhancement via additives2025
Method of manufacturing semiconductor devices and pattern formation method2025
Method of manufacturing a semiconductor device2025
Treatment of spin on organic material to improve wet resistance2025
Method for forming and using mask2025
Semiconductor device and method2025
Semiconductor device and method2025
Photoresist composition and method of forming photoresist pattern2025
Method of manufacturing a semiconductor device2025