Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and system for improved overlay correction

Method and system for improved overlay correction

US Patent 8867018 · Granted Oct 21, 2014

Estimated economic value: $5,194,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor wafer transportation2019
Semiconductor wafer transportation2017
Intra-field process control for lithography2017
Lithographic overlay sampling2017
Calibration apparatus and an adjustment method for a lithography apparatus2017
Dynamic compensation in advanced process control2016
Scanner overlay correction system and method2016
Scanner overlay correction system and method2015
Scanner overlay correction system and method2014
System and method for improved automated semiconductor wafer manufacturing2014
System and method for improved automated semiconductor wafer manufacturing2013
Defense system in advanced process control2012