Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for designing optical lithography masks for directed self-assembly

Method for designing optical lithography masks for directed self-assembly

US Patent 8856693 · Granted Oct 7, 2014

Estimated economic value: $3,450,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Anti-fuse and fuse structures for improving the functionality of qubit circuits2025
Programmable and reprogrammable quantum circuit2025
EUV metallic resist performance enhancement via additives2025
Expert-in-the-loop AI for materials generation2025
Rechargeable metal halide battery2025
EUV metallic resist performance enhancement via additives2025
Anti-fuse and fuse structures for improving the functionality of qubit circuits2025
Metal-compound-removing solvent and method in lithography2025
Metal halide cathode with enriched conductive additive2025
Extreme ultraviolet photolithography method with developer composition2024
Expert-in-the-loop AI for materials discovery2024
Generating metal-oxide film2024