Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › High selectivity, low damage electron-beam delineation etch

High selectivity, low damage electron-beam delineation etch

US Patent 8778804 · Granted Jul 15, 2014

Estimated economic value: $4,468,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Halogen generator2024
Method, device and system for the treatment of biological cryogenic samples by p2023
Charged particle beam source2022
Halogen generator2021
Method for alignment of a light beam to a charged particle beam2020
Attachment of nano-objects to beam-deposited structures2019
Attachment of nano-objects to beam-deposited structures2019
Charged particle beam-induced etching2018
Seed layer laser-induced deposition2018
Material characterization using ion channeling imaging2018
Method of depositing material2018
Localized, in-vacuum modification of small structures2017