Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for producing resin solution for photoresist, photoresist composition, and pattern-forming method

Method for producing resin solution for photoresist, photoresist composition, and pattern-forming method

US Patent 8753793 · Granted Jun 17, 2014

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Monomer, resin for photoresist, resin composition for photoresist, and pattern f2025
Photoresist resin, method for producing photoresist resin, photoresist resin com2025
Complex diversity for accurate phase retrieval with single shot acquisition2025
Aberration estimating method, aberration estimating apparatus, and storage mediu2024
Aberration estimating method, aberration estimating apparatus, and storage mediu2022
Monomer having N-acyl carbamoyl group and lactone skeleton, and polymeric compou2018
Image estimating method including calculating a transverse cutoff frequency, non2017
Digital holography three-dimensional imaging apparatus and digital holography th2017
Semiconductor device and method for manufacturing the same2016
Confocal microscope2016
Polymer compound, resin composition for photoresists, and method for producing s2016
Polymer compound, resin composition for photoresists, and method for producing s2016