Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for integrated circuit manufacturing and mask data preparation using curvilinear patterns

Method for integrated circuit manufacturing and mask data preparation using curvilinear patterns

US Patent 8637211 · Granted Jan 28, 2014

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Computing parasitic values for semiconductor designs2025
Methods and systems to determine parasitics for semiconductor or flat panel disp2025
Generating and display an animation of a predicted overlap shape in an IC design2025
Methods to improve the durability of metal-supported solid oxide electrochemical2025
Computing parasitic values for semiconductor designs2025
Methods and systems to determine shapes for semiconductor or flat panel display 2025
Methods and systems for reticle enhancement technology of a design pattern to be2025
Method and system for reticle enhancement technology2025
Methods and systems for reticle enhancement technology of a design pattern to be2025
Method and system for determining a charged particle beam exposure for a local p2025
Fabrication processes for metal-supported proton conducting solid oxide electroc2025
Method for reticle enhancement technology of a design pattern to be manufactured2024