Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and system for removal of contaminates from phaseshift photomasks

Method and system for removal of contaminates from phaseshift photomasks

US Patent 8627836 · Granted Jan 14, 2014

Estimated economic value: $7,948,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods and apparatus to control architectural coverings2025
Architectural opening coverings and methods2016
Apparatus and method for monitoring and controlling a covering for an architectu2013
Methods for forming and cleaning photolithography reticles2010
Method and system for removal of contaminates from phaseshift photomasks2007
Method and system for removal of contaminates from phaseshift photomasks2007
Method and system for removal of contaminates from phaseshift photomasks2006
Method and system for removal of contaminates from phaseshift photomasks2006
Rotating fiber optic switch2005
Frequency-controlled optical switch1999
Tennis racket cover and bag with measuring strap1991