Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › High voltage semiconductor device including field shaping layer and method of fabricating the same

High voltage semiconductor device including field shaping layer and method of fabricating the same

US Patent 8557674 · Granted Oct 15, 2013

Estimated economic value: $4,916,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Display device and method of manufacturing same2025
System and method to control a cross domain workflow based on a hierachical engi2025
Electronic authentication system and method of supporting multi-signature2025
Chip-on-film test board2024
Utensil handle2024
Utensil handle2023
Pizza wheel2023
Peeler2023
Ice cream scoop2023
Ice cream scoop2023
Grater2023
Multiplexing signal processing device based on semiconductor passive element2023