Method of forming polycrystalline silicon layer and atomic layer deposition apparatus used for the same

Assignee

• Samsung

Inventors

• Yun-Mo Chung (85 patents)
• Ki-Yong Lee (149 patents)
• Min Jae Jeong (79 patents)
• Jin-Wook Seo (144 patents)
• Jong-Won Hong (37 patents)
• Heung-Yeol Na (30 patents)
• Eu-Gene Kang (16 patents)
• Seok Chang (45 patents)
• Tae-Hoon Yang (134 patents)
• Ji-Su Ahn (13 patents)
• Young-Dae Kim (91 patents)
• Byoung-Keon Park (79 patents)
• Kil-Won Lee (43 patents)
• Dong Hyun Lee (303 patents)
• Sang-Yon Yoon (4 patents)
• Jong-Ryuk Park (46 patents)
• Bo-Kyung Choi (34 patents)
• Maxim Lisachenko (10 patents)

View full patent text on Google Patents →