Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Fast photolithography process simulation to predict remaining resist thickness

Fast photolithography process simulation to predict remaining resist thickness

US Patent 8473271 · Granted Jun 25, 2013

Estimated economic value: $3,652,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Prioritized mask correction2023
Using mask fabrication models in correction of lithographic masks2023
Inclusion of stochastic behavior in source mask optimization2022
Stochastic signal prediction in compact modeling2022
Undercut EUV absorber reflective contrast enhancement2022
Lithography improvement based on defect probability distributions and critical d2022
Reflective EUV mask absorber manipulation to improve wafer contrast2021
Design-prioritized mask correction2021
Optical source compensation2021
Compact modeling for the negative tone development processes2020
Compact OPC model generation using virtual data2019
Compact OPC model generation using virtual data2019