Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for correcting critical dimension of phase shift mask and method for manufacturing the same

Method for correcting critical dimension of phase shift mask and method for manufacturing the same

US Patent 8455159 · Granted Jun 4, 2013

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of fabricating reflective photomask2017
Reflection-type photomasks and methods of fabricating the same2014