Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for depositing microcrystalline silicon and monitor device of plasma enhanced deposition

Method for depositing microcrystalline silicon and monitor device of plasma enhanced deposition

US Patent 8435803 · Granted May 7, 2013

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Conductive structure interconnects with downward projections2025
Source/drain metal contact and formation thereof2025
Biomolecular image sensor and method thereof for detecting biomolecule2025
Clock control method and electronic device thereof2025
Semiconductor device with metal cap on gate2025
Semiconductor device2025
Etching methods for integrated circuits2025
Semiconductor device having backside via and method of fabricating thereof2025
Semiconductor device structure and methods of forming the same2025
Semiconductor device structure2025
Air spacer and capping structures in semiconductor devices2025
Semiconductor device structure and method for forming the same2025