Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Electrode orientation and parallelism adjustment mechanism for plasma processing systems

Electrode orientation and parallelism adjustment mechanism for plasma processing systems

US Patent 8394233 · Granted Mar 12, 2013

Estimated economic value: $11,235,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor processing chamber with dual-lift mechanism for edge ring elevatio2025
Plasma processing devices having multi-port valve assemblies2024
Apparatus for spatial and temporal control of temperature on a substrate2022
Chamber with vertical support stem for symmetric conductance and RF delivery2020
Apparatus for spatial and temporal control of temperature on a substrate2020
Chamber with vertical support stem for symmetric conductance and RF delivery2019
Chamber with vertical support stem for symmetric conductance and RF delivery2018
Plasma processing devices having multi-port valve assemblies2018
Floating collar clamping device for auto-aligning nut and screw in linear motion2015
Plasma processing systems with mechanisms for controlling temperatures of compon2014
Apparatus for spatial and temporal control of temperature on a substrate2014
Method for spatial and temporal control of temperature on a substrate2014