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Home › Plasma radiation source, method of forming plasma radiation, apparatus for projecting a pattern from a patterning device onto a substrate and device manufacturing method

Plasma radiation source, method of forming plasma radiation, apparatus for projecting a pattern from a patterning device onto a substrate and device manufacturing method

US Patent 8362444 · Granted Jan 29, 2013

Estimated economic value: $8,405,000 ⓘ

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