Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Overlay marks, methods of overlay mark design and methods of overlay measurements

Overlay marks, methods of overlay mark design and methods of overlay measurements

US Patent 8330281 · Granted Dec 11, 2012

Estimated economic value: $19,789,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Robust and accurate overlay target design for CMP2025
Single cell in-die metrology targets and measurement methods2025
Predicting tool induced shift using Moiré overlay targets2025
Multi-layered moiré targets and methods for using the same in measuring misregis2025
Metrology target design for tilted device designs2024
Imaging overlay targets using moiré elements and rotational symmetry arrangement2024
Measurement of stitching error using split targets2024
Overlay mark design for electron beam overlay2024
Reduction or elimination of pattern placement error in metrology measurements2024
Verification metrology targets and their design2024
Verification metrology targets and their design2024
Overlay mark design for electron beam overlay2024