Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Cleanup method for optics in immersion lithography supplying cleaning liquid at different times than immersion liquid

Cleanup method for optics in immersion lithography supplying cleaning liquid at different times than immersion liquid

US Patent 8269946 · Granted Sep 18, 2012

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Processing system, processing method, computer program, recording medium, and co2024
Cleanup method for optics in immersion lithography using object on wafer holder 2018
Cleanup method for optics in immersion lithography using bubbles2014
Cleanup method for optics in immersion lithography with cleaning liquid opposed 2014
Cleanup method for optics in immersion lithography supplying cleaning liquid ont2013
Cleanup method for optics in immersion lithography using sonic device2011
Cleanup method for optics in immersion lithography2009
Scanning exposure method2003
Scanning type exposure method2001
Projection exposure method and method of manufacturing a projection exposure app2001
Projection exposure method in which mask patterns are imaged on photosensitive s1999
Alignment method1997