Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Gas distribution system and method for distributing process gas in a processing system

Gas distribution system and method for distributing process gas in a processing system

US Patent 8252114 · Granted Aug 28, 2012

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods to automatically adjust one or more parameters of a camera system for op2025
Apparatus and methods for beam processing of substrates2024
Apparatus and method for spin processing2024
System and method for liquid dispense and coverage control2024
Atmospheric plasma processing systems and methods for manufacture of microelectr2021
Electromagnetic wave treatment of a substrate at microwave frequencies using a w2019
Processing system for electromagnetic wave treatment of a substrate at microwave2019
Heated stage with variable thermal emissivity method and apparatus2019
Computed tomography using intersecting views of plasma using optical emission sp2019
Method and apparatus for reducing substrate temperature variability2013
Method and system for measuring a flow rate in a solid precursor delivery system2013
Method and system for improving deposition uniformity in a vapor deposition syst2011