Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for overlay compensation between subsequently patterned layers on workpiece

Method and apparatus for overlay compensation between subsequently patterned layers on workpiece

US Patent 8137875 · Granted Mar 20, 2012

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Pick-and-place tool2017
Method and apparatus for performing pattern alignment to die2016
Apparatuses and methods for compensation of carrier distortions from measurement2015
Apparatus for generating patterns on workpieces2015
Method and apparatus for alignment optimization with respect to plurality of lay2015
Method and apparatus for performing alignment using reference board2015
Method and apparatus for performing pattern alignment to plurality of dies2013
Method and apparatus for alignment optimization with respect to plurality of lay2013
Method and apparatus for performing pattern reconnection after individual or mul2013
Method of iterative compensation for non-linear effects in three-dimensional exp2011
Method of compensation for bleaching of resist during three-dimensional exposure2011
Multi-focus method of enhanced three-dimensional exposure of resist2011