Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Remote plasma cleaning source having reduced reactivity with a substrate processing chamber

Remote plasma cleaning source having reduced reactivity with a substrate processing chamber

US Patent 8075789 · Granted Dec 13, 2011

Estimated economic value: $5,494,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for powder removal in an additive manufacturing system2025
Printing method for additive manufacturing, including in-situ powder regeneratio2025
Chlorella compositions and methods of use thereof to enhance plant growth2022
Thin film deposition in a high aspect ratio feature2021
Current compliance layers and memory arrays comprising thereof2020
Current compliance layers and memory arrays comprising thereof2020
Vapor based site-isolated processing systems and methods2019
Interdigitated finger coextrusion device2019
Method for interdigitated finger coextrusion2018
Printed fuel cell with integrated gas channels2017
Electrodialytic separation of CO2 gas from seawater2017
Interdigitated electrode device2017