Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Chemically amplified resist composition and chemically amplified resist composition for immersion lithography

Chemically amplified resist composition and chemically amplified resist composition for immersion lithography

US Patent 8062829 · Granted Nov 22, 2011

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Diaphragm suppressing pressure sensor2020
Resist composition2020
Resin and resist composition2020
Pressure sensor that measures the pressure within a combustion chamber of an int2020
Compact drying method2019
Resist composition2018
Resin joined body and method for manufacturing same2017
Salt, acid generator, resist composition and method for producing resist pattern2017
Spark plug2017
Photoresist composition2015
Resin and resist composition2015
Photoresist composition2014