Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Low contamination, low energy beamline architecture for high current ion implantation

Low contamination, low energy beamline architecture for high current ion implantation

US Patent 7994488 · Granted Aug 9, 2011

Estimated economic value: $1,138,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

High mass resolution low aberration analyzer magnet for ribbon beams and the sys2012
Extraction electrode system for high current ion implanter2011
Method and system for ion beam profiling2010
Ion source arc chamber seal2010
Beam stop and beam tuning methods2009
Method of reducing particle contamination for ion implanters2009
Closed loop dose control for ion implantation2009
Charged beam dump and particle attractor2009
System and method of ion beam control in response to a beam glitch2009
High conductance ion source2009
Beam tuning with automatic magnet pole rotation for ion implanters2009
Hybrid magnetic/electrostatic deflector for ion implantation systems2005