Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Lithography mask design through mask functional optimization and spatial frequency analysis

Lithography mask design through mask functional optimization and spatial frequency analysis

US Patent 7856612 · Granted Dec 21, 2010

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods for modeling of a design in reticle enhancement technology2025
Methods and systems for reticle enhancement technology of a design pattern to be2025
Methods and systems for reticle enhancement technology of a design pattern to be2025
Training of machine learning-based inverse lithography technology for mask synth2024
Method for reticle enhancement technology of a design pattern to be manufactured2024
Methods for modeling of a design in reticle enhancement technology2024
Method for reticle enhancement technology of a design pattern to be manufactured2024
Method for reticle enhancement technology of a design pattern to be manufactured2023
Method for reticle enhancement technology of a design pattern to be manufactured2023
Methods for modeling of a design in reticle enhancement technology2023
Methods for modeling of a design in reticle enhancement technology2022
Modeling of a design in reticle enhancement technology2021