Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma control using dual cathode frequency mixing and controlling the level of polymer formation

Plasma control using dual cathode frequency mixing and controlling the level of polymer formation

US Patent 7736914 · Granted Jun 15, 2010

Estimated economic value: $8,018,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Secure certificate or key distribution for synchronous mobile device management 2025
Temperature adjusting apparatus and method for a focus ring2020
Light-emitting device including nano particle having core shell structure2018
Optoelectronic device including quantum dot2018
Apparatus for controlling the flow of a gas in a process chamber2016
Method and apparatus for shaping a magnetic field in a magnetic field-enhanced p2015
Method and apparatus for shaping a magnetic field in a magnetic field-enhanced p2015
Chamber with uniform flow and plasma distribution2014
Pulsed bias plasma process to control microloading2013
Temperature enhanced electrostatic chucking in plasma processing apparatus2013
Method of controlling etch microloading for a tungsten-containing layer2013
Plasma reactor apparatus with multiple gas injection zones having time-changing 2012