Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography

Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography

US Patent 7696292 · Granted Apr 13, 2010

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Candle and method of making thereof2025
Projection exposure apparatus and method for measuring a projection lens2020
Multicomponent, internally structured nanoemulsions and methods of production2019
Substantially symmetrical 3-arm star block copolymers2017
Process and materials for making contained layers and devices made with same2016
Preparation, purification and use of high-X diblock copolymers2015
Process and system for reducing sizes of emulsion droplets and emulsions having 2015
Branched copolymer/anthranilic diamide compositions for propagule coating2014
Method for membrane protection during reactive ion/plasma etching processing for2013
Synthesis of fluoroalcohol-substituted (meth)acrylate esters and polymers derive2012
Screen-printable encapsulants based on soluble polybenzoxazoles2012
Hydrofluoroalkanesulfonic acids and salts from fluorovinyl ethers2011