Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › CMP composition with a polymer additive for polishing noble metals

CMP composition with a polymer additive for polishing noble metals

US Patent 7563383 · Granted Jul 21, 2009

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Low pressure fluctuation apparatuses for blending fluids, and methods of using t2022
Slurry supply and/or chemical blend supply apparatuses, processes, methods of us2020
Slurry supply and/or chemical blend supply apparatuses, processes, methods of us2017
CMP compositions and methods for suppressing polysilicon removal rates2014
Compositions for polishing silicon-containing substrates2013
Compositions for CMP of semiconductor materials2013
Methods and compositions for polishing silicon-containing substrates2012
Chemical-mechanical polishing composition and method for using the same2012
Chemical-mechanical polishing composition and method for using the same2012
Compositions and methods for CMP of semiconductor materials2010
CMP system utilizing halogen adduct2010
Compositions and methods for CMP of low-k-dielectric materials2008