Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Lithographic apparatus and device manufacturing method utilizing a MEMS mirror with large deflection using a non-linear spring arrangement

Lithographic apparatus and device manufacturing method utilizing a MEMS mirror with large deflection using a non-linear spring arrangement

US Patent 7528933 · Granted May 5, 2009

Estimated economic value: $3,221,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of operating a patterning device and lithographic apparatus2018
Lithographic apparatus, device manufacturing method, and method of applying a pa2017
Method of operating a patterning device and lithographic apparatus2017
Method of operating a patterning device and lithographic apparatus2016
Lithographic apparatus and device manufacturing method of applying a pattern to 2014
Level sensor, lithographic apparatus, and substrate surface positioning method2014
Lithographic apparatus and device manufacturing method2012
System and method for compensating for radiation induced thermal distortions in 2010
Lithographic apparatus, device manufacturing method and energy sensor2010
Optimized correction of wafer thermal deformations in a lithographic process2009
Lithographic apparatus and device manufacturing method utilizing 2D run length e2009
Variable lens and exposure system2008