Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Yield-limiting design-rules-compliant pattern library generation and layout inspection

Yield-limiting design-rules-compliant pattern library generation and layout inspection

US Patent 7458060 · Granted Nov 25, 2008

Estimated economic value: $3,474,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Maskless vortex phase shift optical direct write lithography2015
Maskless vortex phase shift optical direct write lithography2013
Maskless vortex phase shift optical direct write lithography2011
Optimized mirror design for optical direct write2010
Method and systems for utilizing simplified resist process models to perform opt2009
Process and apparatus for achieving single exposure pattern transfer using maskl2008
Method and apparatus for verifying the post-optical proximity corrected mask waf2008
Process window compliant corrections of design layout2007
Optimized mirror design for optical direct write2007
OPC based illumination optimization with mask error constraints2007
Process and apparatus for generating a strong phase shift optical pattern for us2007
Method and system for utilizing an isofocal contour to perform optical and proce2006