Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Temperature control for single substrate semiconductor processing reactor

Temperature control for single substrate semiconductor processing reactor

US Patent 7427329 · Granted Sep 23, 2008

Estimated economic value: $2,473,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for contactlessly advancing substrates2020
Dynamic fluid valve and method for establishing the same2017
Floating substrate monitoring and control device, and method for the same2016
Selective oxidation process2015
Selective removal of oxygen from metal-containing materials2014
Stable silicide films and methods for making the same2013
Semiconductor processing parts having apertures with deposited coatings and meth2012
Protective inserts to line holes in parts for semiconductor process equipment2011
Protective inserts to line holes in parts for semiconductor process equipment2011
Method and device for determining the temperature of a substrate2011
Method and device for determining the temperature of a substrate2011
Semiconductor processing parts having apertures with deposited coatings and meth2010